Hakuto’s Ion Beam Milling (Etching) System
Introducing Hakuto’s Ion Beam Milling (Etching) System which is an optimal etching technology for Magnetic materials, Gold, Platinum, Alloyed metals, and Compound semiconductor materials.
- Capable to etch any materials, including hard to etch materials(Magnetic and some dielectric materials, Metals).
- Etching gas is Ar only. (Toxic Gas free).
- Provides excellent etching uniformity.
- Flexibility for the etching condition.
- No need to change the recipe for each layer of multilayer stacks as seen in Spintronics. (only one recipe is enough)
- Excellent cooling system for substrate.
- No grease is required to fix the substrate.
- Several different sizes of substrate available.
- Easy to customize based on customer’s needs and budget.
- End point detector (Optional)*
Few examples of target application:
- Thin film magnetic head
- RF devices / SAW Device
- Optical component
- MR Sensor
- Super conductivity
Evaluation services to Etch customer’s samples can be provided upon request.